Spin coating properties of SU-8 thick-layer photoresist

Ren-Haw Chen; Chao-Min Cheng

doi:10.1117/12.436881

24 August 2001 Spin coating properties of SU-8 thick-layer photoresist

Ren-Haw Chen, Chao-Min Cheng

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436881
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coater and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.

Citation Download Citation

Ren-Haw Chen and Chao-Min Cheng "Spin coating properties of SU-8 thick-layer photoresist", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436881

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