Silicon-containing resists for 157-nm applications

Ratnam Sooriyakumaran; Debra Fenzel-Alexander; Nicolette Fender; Gregory M. Wallraff; Robert D. Allen

doi:10.1117/12.436861

24 August 2001 Silicon-containing resists for 157-nm applications

Ratnam Sooriyakumaran, Debra Fenzel-Alexander, Nicolette Fender, Gregory M. Wallraff, Robert D. Allen

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436861
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We have designed and developed an aqueous base soluble polymer system with a silsequioxane (SSQ) backbone for 157nm bilayer resist applications. These base resins have absorbances as low as 0.6micrometers ^-1 at 157nm. The imagable polymers which contain acid-labile ester functionalities have absorbances between 2.0 and 3.0micrometers ^-1. The silicon content of these polymers is around 15% by weight. Therefore, our polymers can be utilized in 157nm positive bilayer resist applications with a film thickness of around 150nm. We have evaluated several resist formulations based on these polymers. These resist formulations have shown high contrast and excellent resolution.

Citation Download Citation

Ratnam Sooriyakumaran, Debra Fenzel-Alexander, Nicolette Fender, Gregory M. Wallraff, and Robert D. Allen "Silicon-containing resists for 157-nm applications", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436861

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