Resist materials for 157-nm lithography

Minoru Toriumi; Seiichi Ishikawa; Seiro Miyoshi; Takuya Naito; Tamio Yamazaki; Manabu Watanabe; Toshiro Itani

doi:10.1117/12.436868

24 August 2001 Resist materials for 157-nm lithography

Minoru Toriumi, Seiichi Ishikawa, Seiro Miyoshi, Takuya Naito, Tamio Yamazaki, Manabu Watanabe, Toshiro Itani

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436868
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Fluoropolymers are key materials for single layer resists of 157nm lithography. We have been studying fluoropolymers to identify their potential for base resins of 157nm photoresist. Many fluoropolymers showed high optical transparencies, with absorption coefficients of 0.01micrometers ^-1 to 2micrometers ^{-1 at 157nm, and dry- etching resistance comparable to an ArF resist, and non- swelling solubility in the standard developer. Positive- tone resists were formulated using fluoropolymers that fulfill practical resist requirements. They showed good sensitivities, from 1 mJ/cm(superscript 2} to 10 mJ/cm², and contrast in the sensitivity curves. They were able to be patterned using a F₂ laser microstepper.

Citation Download Citation

Minoru Toriumi, Seiichi Ishikawa, Seiro Miyoshi, Takuya Naito, Tamio Yamazaki, Manabu Watanabe, and Toshiro Itani "Resist materials for 157-nm lithography", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436868

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