Creation of low-molecular-weight organic resists for nanometer lithography

Toshiaki Kadota; Motoko Yoshiiwa; Hiroshi Kageyama; Fujio Wakaya; Kenji Gamo; Yasuhiko Shirota

doi:10.1117/12.436812

24 August 2001 Creation of low-molecular-weight organic resists for nanometer lithography

Toshiaki Kadota, Motoko Yoshiiwa, Hiroshi Kageyama, Fujio Wakaya, Kenji Gamo, Yasuhiko Shirota

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436812
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Several amorphous molecular materials that function as positive or negative electron-beam resists, to which we refer as molecular resists, have been created. They include 1,3,5-tris[4-(4-toluenesulfonyloxy)phenyl]benzene (TsOTPB), 1,3,5-tris[4-(tert-butoxycarbonylmethoxy)phenyl]benzene (BCMTPB), 4,4',4'-tris(allylsuccinimido)triphenylamine (ASITPA), 1,3,5-tris[2-(4-vinylphenylcarbonyloxy)phenyl]benzene (o-VCTPB), 1,3,5-tris[3-(4-vinylphenylcarbonyloxy)phenyl]benzene (m-VCTPB), and 1,3,5-tris[4-(4-vinylphenylcarbonyloxy)phenyl]benzene (p-VCTPB). These molecular resists permitted the fabrication of line patterns with a high resolution from 150 to 70 nm on exposure to an electron beam.

Citation Download Citation

Toshiaki Kadota, Motoko Yoshiiwa, Hiroshi Kageyama, Fujio Wakaya, Kenji Gamo, and Yasuhiko Shirota "Creation of low-molecular-weight organic resists for nanometer lithography", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436812

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