Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

Takao Tamura; Takahiro Ema; Hiroshi Nozue; Tamoya Sugahara; Akio Sugano; Jun Nitta

doi:10.1117/12.436693

20 August 2001 Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)

Takao Tamura, Takahiro Ema, Hiroshi Nozue, Tamoya Sugahara, Akio Sugano, Jun Nitta

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436693
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We have developed a stitching accuracy measurement system for electron beam (EB) direct writing and electron beam projection lithography (EPL). This system calculates the amount of a stitching error between two EB shots from SEM images. It extracts a representative edge line of each pattern from the graphical format files (BMP, JPEG etc.) of SEM images and calculates a distance between each edge line as a stitching error. For obtaining a higher stitching accuracy of EB direct writing or EPL machines, it can analyze the relation of amounts and direction of a stitching error with a field size or a field position of these machines. We could successfully measure about 2.0 nm as a stitching error value in 0.1 micrometers L/S resist patterns on a bare-Si substrate and obtain 1.2 nm (3(sigma) ) as the measurement repeatability. It took 2.5 sec. for this system to measure one stitching region.

Citation Download Citation

Takao Tamura, Takahiro Ema, Hiroshi Nozue, Tamoya Sugahara, Akio Sugano, and Jun Nitta "Stitching accuracy measurement system for EB direct writing and electron-beam projection lithography (EPL)", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436693

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