Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography

Henryk Fiedorowicz; Andrzej Bartnik; Hiroyuki Daido; Roman Jarocki; Rafal Rakowski; Masayuki Suzuki; Miroslaw Szczurek; Susumu Yamagami

doi:10.1117/12.436680

20 August 2001 Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography

Henryk Fiedorowicz, Andrzej Bartnik, Hiroyuki Daido, Roman Jarocki, Rafal Rakowski, Masayuki Suzuki, Miroslaw Szczurek, Susumu Yamagami

Author Affiliations +

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436680
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Generation of x-ray and extreme ultraviolet (EUV) radiation from laser-produced source with a new double-stream gas puff target has been investigated. The target was formed by pulsed injection of heavy gas (argon, or xenon) into a hollow gas stream from helium by using a double-nozzle setup. This new approach allows to form a high-density gaseous target at a relatively large distance from the nozzle output. X-ray emission was produced by irradiation of the argon/helium target with pulses of 1 ns time duration with energy up to 20 J from a Nd:glass laser. Strong x-ray emission at the wavelength near 0.4 nm from the argon target, similar to the emission from the solid sulphur target irradiated in the same conditions, have been observed. These new results may be useful to develop a laser-produced radiation source for x-ray lithography. To generate EUV radiation the xenon/helium target was irradiated using a Nd:YAG laser producing pulses of 10 ns and 0.7 J or energy. Efficient production near 11 nm from the xenon target exceeding emissions from solid targets was observed that should be useful for EUV lithography.

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Henryk Fiedorowicz, Andrzej Bartnik, Hiroyuki Daido, Roman Jarocki, Rafal Rakowski, Masayuki Suzuki, Miroslaw Szczurek, and Susumu Yamagami "Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436680

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