Spectral filtering for image sensors

Caroline Bringolf; Patrice J.H. Twardowski; Pierre Blanchard; Herve Moutenet

doi:10.1117/12.426973

15 May 2001 Spectral filtering for image sensors

Caroline Bringolf, Patrice J.H. Twardowski, Pierre Blanchard, Herve Moutenet

Proceedings Volume 4306, Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications II; (2001) https://doi.org/10.1117/12.426973
Event: Photonics West 2001 - Electronic Imaging, 2001, San Jose, CA, United States

Abstract

In order to design and realize multiple wavelength bandpass filters for image sensors, we have investigated optical multi-layer dielectric filters. The filter design is based on a chirped Bragg grating which is approximated by a stack of two alternatively deposited dielectric materials. Multi- layer stacks have been simulated with the rigorous chain- matrix method. The reflection and transmission coefficients of the stacks have been obtained by the multiplication of the respective 2 by 2 characteristics matrices of each layer. Moreover the period and chirping of the discrete chirped of the discrete chirped Bragg gratings have been optimized to match the blue spectral response. The filter band has been designed to transmit the 400-500nm wavelengths and to reflect the other visible spectrum wavelengths. Single layers of silicon oxide and silicon nitride have been deposited using a PECVD process. The characterization of these layers have been made by ellipsometry, and has led to a modification of the nitride deposition process to improve its optical characteristics. The compete stack has been deposited on a quartz substrate, and the reflectance and the transmittance have been measured. The next step is to improve the deposition process.

Citation Download Citation

Caroline Bringolf, Patrice J.H. Twardowski, Pierre Blanchard, and Herve Moutenet "Spectral filtering for image sensors", Proc. SPIE 4306, Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications II, (15 May 2001); https://doi.org/10.1117/12.426973

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KEYWORDS

Silicon

Optical filters

Oxides

Refractive index

Deposition processes

Reflectivity

Holograms

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