Using manufacturing rule check to prescreen reticle inspection databases

Charles H. Howard; Paul DePesa; Curt J. Linder

doi:10.1117/12.410684

22 January 2001 Using manufacturing rule check to prescreen reticle inspection databases

Charles H. Howard, Paul DePesa, Curt J. Linder

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410684
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

New reticle designs frequently contain mask features the inspection tools find objectionable. Typically these illegal features are handled in one of two ways. They are removed from the database with “do not inspect” regions, or the sensitivity is compromised to a level sufficient to reduce these nuisance defects to a tolerable level. Using the inspection machine to find these areas is both costly and inefficient. This paper presents a survey of the Manufacturing Rules Check option available from Transcription Enterprises to screen the database for these features before the reticle goes to inspection.

Citation Download Citation

Charles H. Howard, Paul DePesa, and Curt J. Linder "Using manufacturing rule check to prescreen reticle inspection databases", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410684

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