Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source

Russell J. Westerman; Chris Constantine; Jason Plumhoff; C. Strawn

doi:10.1117/12.410708

22 January 2001 Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source

Russell J. Westerman, Chris Constantine, Jason Plumhoff, C. Strawn

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410708
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

As on-glass line widths shrink and exposure wavelengths approach the physical limitations of optical lithographic printing, the adoption of newer technology such as Off-Axis Illumination and Phase Shift Photomask technologies will substantially expand the operating life of DUV lithographic tools. In this article, the dry etch processes and Inductively Coupled Plasma (ICP) hardware iterations associated with the etch optimization of Levenson-style hard shifters are explored. These Alternating Aperture Hard Shifters currently adopt a single material form, with Levenson-style photomasks making use of a precise removal of quartz material between the Cr lines of a standard Photomask, improving the resolution of the exposed features. This precise quartz removal is performed utilizing dry etch technologies, with the use of high density, de-coupled plasmas such as ICP preferred. We explore Inductively Coupled Plasma shaping techniques along with newer etch processes for these materials, offering a Next Generation ICP Source design. Process conditions are verified and on-mask results are reported.

Citation Download Citation

Russell J. Westerman, Chris Constantine, Jason Plumhoff, and C. Strawn "Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410708

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