Lithographic performance results for a new 50-kV electron-beam mask writer

Varoujan Chakarian; Stephen R. Bylciw; Charles A. Sauer; David Trost; Marek Zywno; Robin Teitzel; Frederick Raymond III; Frank E. Abboud

doi:10.1117/12.410672

22 January 2001 Lithographic performance results for a new 50-kV electron-beam mask writer

Varoujan Chakarian, Stephen R. Bylciw, Charles A. Sauer, David Trost, Marek Zywno, Robin Teitzel, Frederick Raymond III, Frank E. Abboud

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410672
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

Current pattern generation tool designs will be inadequate to meet the advanced requirements for next-generation masks, particularly at the 100 nm node. Etec Systems, Inc. has developed a complete raster-based patterning solution to provide improved resolution, critical dimension (CD) uniformity, positional accuracy, and throughput. This solution meets the challenges of the 130-nm device generation with extendibility to at least 100 nm devices. Our complete patterning solution includes an electron-beam (e-beam) pattern generation system and a new 50 kV process. The e-beam system includes a column with 50 kV accelerating voltage and a new graybeam writing technique. To accomplish this technique, a pulse-width modulated blanking system, per-pixel deflection, retrograde scanning, and multiphase and multipass writing are used. This combination of features results in markedly improved lithographic performance and enables the use of conventional high-contrast resists for faster process implementation. Additional significant innovations of this pattern generation system include a novel stage design, an integrated automated material handling system (AMHS), on-board diagnostics, and improved environmental/thermal management. We believe this comprehensive patterning solution offers the best combination of benefits to the user in terms of versatility and extendibility.

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Varoujan Chakarian, Stephen R. Bylciw, Charles A. Sauer, David Trost, Marek Zywno, Robin Teitzel, Frederick Raymond III, and Frank E. Abboud "Lithographic performance results for a new 50-kV electron-beam mask writer", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410672

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