High-accuracy laser mask repair system LM700A

Yoichi Yoshino; Yukio Morishige; Shuichi Watanabe; Yukio Kyusho; Atsushi Ueda; Tutomu Haneda; Makoto Ohmiya

doi:10.1117/12.410680

22 January 2001 High-accuracy laser mask repair system LM700A

Yoichi Yoshino, Yukio Morishige, Shuichi Watanabe, Yukio Kyusho, Atsushi Ueda, Tutomu Haneda, Makoto Ohmiya

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410680
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

High throughput laser mask repair system satisfying the accuracy demanded for 0.5 jum pattern rule reticles has been newly developed. The named Laser Mask Repair LM700A has the following features: ? Opaque defect repair capability of 0.5 ?m L&S patterns ? High repair accuracy of 45 nm (3 sigma) ? Quartz damage depth of less than 20nm ? Transmission at the repair site of more than 96% ? Pico-second solid state UV pulse laser and high resolution UV Optics Laser wavelength : 351 nm Laser pulse duration : less than 300 ps Observation wavelength : 365 nm By utilizing a pico-second UV pulse laser, very high quality laser zapping can be obtained. This paper presents the configuration and the evaluated results for mask repair performance in conventional Cr binary masks.

Citation Download Citation

Yoichi Yoshino, Yukio Morishige, Shuichi Watanabe, Yukio Kyusho, Atsushi Ueda, Tutomu Haneda, and Makoto Ohmiya "High-accuracy laser mask repair system LM700A", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410680

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