CARs blanks feasibility study results for advanced EB reticle fabrication

Masahiro Hashimoto; Hideo Kobayashi; Yasunori Yokoya

doi:10.1117/12.410738

22 January 2001 CARs blanks feasibility study results for advanced EB reticle fabrication

Masahiro Hashimoto, Hideo Kobayashi, Yasunori Yokoya

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410738
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

For advanced EB reticle fabrication, we have been studying chemically amplified resist (CAR) blanks feasibility as a mission of blanks supplier, since the mask-makers are likely to procure resist-coated blanks even with CARs for the future as they have been. In our study, we found several difficulties to utilize CARs for mask-making, such as CD movement due to delays in process, excess footing, CAR poor adhesion to chrome, spray-develop damage defects and so on. Then, we are working on solutions by joint-work with some resist makers, by new CARs development and process optimization. In addition, we did CARs performance comparison, by a practical 50keV-exposure tool, between a newly developed CAR and Tokyo Ohka Kogyo EP-009 as a benchmark, which was previously selected. This paper describes our findings how to use CARs for mask making as well as our comparative evaluation results between EP-009 and a newly developed CAR. 1. INTRODUCTION

Citation Download Citation

Masahiro Hashimoto, Hideo Kobayashi, and Yasunori Yokoya "CARs blanks feasibility study results for advanced EB reticle fabrication", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410738

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