Paper
10 August 2000 Micro nano technology visualization (MNTV) of micromachined MEMS polysilicon structures
Russell A. Lawton, Gisela Lin, Joanne Wellman, Leslie M. Phinney, Jose Uribe, Edward Griffith, Ingrid De Wolf, Eric Lawrence
Author Affiliations +
Proceedings Volume 4180, MEMS Reliability for Critical Applications; (2000) https://doi.org/10.1117/12.395698
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
Micro-Nano Technology Visualization (MNTV) is critical to studies in MEMS reliability. The ability to see and characterize the microstructures and interfaces with high resolution at the microscale and nanoscale is invaluable. In this paper we present the motivation, paradigm and examples of visualization techniques applied to several aspects of surface micromachined polysilicon structures. High resolution cross-section imaging, using both a FIB/SEM and FIB/STEM, is used to acquire information on profile differences between fabrication facilities and grain size and orientation. The AFM is used to compare surface roughness on both sides (top and bottom surfaces) of thin film polysilicon after release etching. The data gathered will be extremely useful feedback for fabrication facilities in terms of process characterization and quality assurance. The data will also be useful for MEMS CAD tools where device and process models must be validated.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Russell A. Lawton, Gisela Lin, Joanne Wellman, Leslie M. Phinney, Jose Uribe, Edward Griffith, Ingrid De Wolf, and Eric Lawrence "Micro nano technology visualization (MNTV) of micromachined MEMS polysilicon structures", Proc. SPIE 4180, MEMS Reliability for Critical Applications, (10 August 2000); https://doi.org/10.1117/12.395698
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Cited by 5 scholarly publications.
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KEYWORDS
Microelectromechanical systems

Reliability

Visualization

Computer aided design

Etching

Data modeling

Oxides

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