Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo; Noriaki Kandaka; Katsumi Sugisaki; Tetsuya Oshino; Masayuki Shiraishi; Wakana Ishiyama; Katsuhiko Murakami

doi:10.1117/12.405906

2 November 2000 Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Author Affiliations +

Proceedings Volume 4144, Advances in Laboratory-based X-Ray Sources and Optics; (2000) https://doi.org/10.1117/12.405906
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

In order to evaluate the performance of multilayer optics, we have successfully developed a simple, laboratory-sized reflectometer that can be operated readily on a routine basis. This reflectometer makes use of a single line emission at the wavelength of 12.98 nm from a CO₂ gas-jet laser-plasma x-ray source that can be readily operated on a routine basis. Our reflectometer achieved repeatability of less than +/- 0.8% in reflectivity measurements. The peak reflectivity of a sample determined by calculation based on multilayer mirror parameters obtained from our reflectometer was within +/- 1.3% of that obtained by an SR-based reflectometer. These results confirm that our reflectometer performs well enough to evaluate multilayer optics.

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Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, and Katsuhiko Murakami "Development of an EUV reflectometer using a laser plasma x-ray source", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); https://doi.org/10.1117/12.405906

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