Electrostatic self-assembly processing of materials and devices

Richard O. Claus; Yanjing Liu; Kristi L. Cooper

doi:10.1117/12.405330

26 October 2000 Electrostatic self-assembly processing of materials and devices

Richard O. Claus, Yanjing Liu, Kristi L. Cooper

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Proceedings Volume 4134, Photonics for Space Environments VII; (2000) https://doi.org/10.1117/12.405330
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Electrostatic self-assembly (ESA) methods have been used to synthesize multilayered thin film organic/inorganic materials and devices. The ESA method involves the dip coating of charged substrates with alternating layers of anionic and cationic molecules, and the properties of the resulting multilayered structures depend on both the characteristics of the individual molecules and the spatial order of the layers. Since the process is performed at room temperature and pressure by dipping substrates into separate solutions containing the charged molecules, coatings may be formed on substrates of virtually any composition, shape and size. Materials that have been investigated for incorporation into such coatings include noble metal nanoclusters, metal oxide nanoclusters, polymers, cage- structured molecules such as fullerenes, proteins, and dipolar chromophore molecules. Such materials have potential applications in photonic and electronic devices.

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Richard O. Claus, Yanjing Liu, and Kristi L. Cooper "Electrostatic self-assembly processing of materials and devices", Proc. SPIE 4134, Photonics for Space Environments VII, (26 October 2000); https://doi.org/10.1117/12.405330

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