Fabrication by wet etching of multilayer GaAIAs/GaAs microtips for SNOM applications

Christophe Gorecki; Sabry Khalfallah; Hideki Kawakatsu; Yasuhiko Arakawa

doi:10.1117/12.401622

29 September 2000 Fabrication by wet etching of multilayer GaAIAs/GaAs microtips for SNOM applications

Christophe Gorecki, Sabry Khalfallah, Hideki Kawakatsu, Yasuhiko Arakawa

Proceedings Volume 4098, Optical Devices and Diagnostics in Materials Science; (2000) https://doi.org/10.1117/12.401622
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

We propose to fabricate GaAlAs/GaAs multi-layer microtips for scanning near-field optical microscope using the anisotropic etching. The etching was performed in a solution of H₃PO₄:H₂O₂:H₂O, operating at the temperature of 10 degree(s)C. We obtained the pyramid-shaped microtips with four etched facets and with a radius of curvature at the apex lower than 50 nm.

Citation Download Citation

Christophe Gorecki, Sabry Khalfallah, Hideki Kawakatsu, and Yasuhiko Arakawa "Fabrication by wet etching of multilayer GaAIAs/GaAs microtips for SNOM applications", Proc. SPIE 4098, Optical Devices and Diagnostics in Materials Science, (29 September 2000); https://doi.org/10.1117/12.401622

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