Mask cleaner innovation

Hidehiro Watanabe; Kenji Masui; Akio Kosaka; Naoya Hayamizu; Akinori Iso; Hachiro Hiratsuka; Yoshiaki Minegishi; Fumiaki Shigemitsu

doi:10.1117/12.392045

19 July 2000 Mask cleaner innovation

Hidehiro Watanabe, Kenji Masui, Akio Kosaka, Naoya Hayamizu, Akinori Iso, Hachiro Hiratsuka, Yoshiaki Minegishi, Fumiaki Shigemitsu

Author Affiliations +

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392045
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

A new clustered configurational photomask cleaning system has been developed. Accepting the clustered configuration, we can be free from the heavy tank photomask cleaner which has a large footprint and has no flexibility for designing a cleaning recipe. Provided we need to introduce a new cleaning process unit, we can substitute the unit by disassembling an old one in the system. We can always keep our photomask cleaner up-to date with the system, and, we can obtain most effective cleaning result by the least efforts and the smallest expense. Using this cleaning system with an optimized cleaning recipe, we have achieved the cleaning result of less than one particle, greater than 0.2 micrometers , detected by KLA Starlight.

Citation Download Citation

Hidehiro Watanabe, Kenji Masui, Akio Kosaka, Naoya Hayamizu, Akinori Iso, Hachiro Hiratsuka, Yoshiaki Minegishi, and Fumiaki Shigemitsu "Mask cleaner innovation", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392045

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KEYWORDS

Photomasks

Ultraviolet radiation

Particles

Contamination

Mask cleaning

Mechatronics

Control systems

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