Paper
5 July 2000 Understanding lens aberration and influences to lithographic imaging
Author Affiliations +
Abstract
Lithographic imaging in the presence of lens aberration result sin unique effects, depending on feature type, size, phase, illumination, and pupil use. As higher demands are placed on optical lithography tools, a better understanding of the influence of lens aberration is required. The goal of this paper is to develop some fundamental relationships and to address issues regarding the importance, influence, and interdependence of imaging parameters and aberration.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce W. Smith and Ralph E. Schlief "Understanding lens aberration and influences to lithographic imaging", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389018
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CITATIONS
Cited by 22 scholarly publications and 1 patent.
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KEYWORDS
Diffraction

Image processing

Lithography

Monochromatic aberrations

Optical proximity correction

Phase shifts

Coherence (optics)

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