High-density lithography using attenuated phase-shift mask and negative resist

Stanley Pau; Raymond A. Cirelli; Kevin J. Bolan; Allen G. Timko; John Frackoviak; Pat G. Watson; Lee E. Trimble; James W. Blatchford; Omkaram Nalamasu

doi:10.1117/12.389015

5 July 2000 High-density lithography using attenuated phase-shift mask and negative resist

Stanley Pau, Raymond A. Cirelli, Kevin J. Bolan, Allen G. Timko, John Frackoviak, Pat G. Watson, Lee E. Trimble, James W. Blatchford, Omkaram Nalamasu

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389015
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We demonstrate a technique to print. high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool and compare our result with that obtained using a binary mask and positive photoresists.

Citation Download Citation

Stanley Pau, Raymond A. Cirelli, Kevin J. Bolan, Allen G. Timko, John Frackoviak, Pat G. Watson, Lee E. Trimble, James W. Blatchford, and Omkaram Nalamasu "High-density lithography using attenuated phase-shift mask and negative resist", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389015

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