Ultraprecision focus technique

Vivek Garg; Boris B. Grek

doi:10.1117/12.386538

2 June 2000 Ultraprecision focus technique

Vivek Garg, Boris B. Grek

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386538
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

A novel method of measuring absolute position using broad band laser interferometry is presented. The interferometer has been designed and implemented as the metric for a real-time stage focus micro-lithography application. Highlights of the metric are high precision (less than 100 nm) and wide range (300 microns).

Citation Download Citation

Vivek Garg and Boris B. Grek "Ultraprecision focus technique", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386538

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