Application of optical proximity correction in manufacturing and its effect on process control

Christine Wallace; Claire Duncan; Brian Martin

doi:10.1117/12.386521

2 June 2000 Application of optical proximity correction in manufacturing and its effect on process control

Christine Wallace, Claire Duncan, Brian Martin

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386521
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Optical proximity correction in terms of linewidth correction at different pitches is used to demonstrate improvement in critical dimension control at the polysilicon layer of a sub- half-micron CMOS process. Further measurements across the image field show the effect on wafer linewidth distributions of different generations of the laser write tool used in reticle manufacturing.

Citation Download Citation

Christine Wallace, Claire Duncan, and Brian Martin "Application of optical proximity correction in manufacturing and its effect on process control", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386521

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