Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure

Leonidas E. Ocola; Myrtle I. Blakey; Paul A. Orphanos; Wai-Yi Li; Anthony E. Novembre; Robert L. Brainard; Joseph F. Mackevich; Gary N. Taylor

doi:10.1117/12.390055

21 July 2000 Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure

Leonidas E. Ocola, Myrtle I. Blakey, Paul A. Orphanos, Wai-Yi Li, Anthony E. Novembre, Robert L. Brainard, Joseph F. Mackevich, Gary N. Taylor

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390055
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Optimization of phenolic chemically amplified resist platforms has lead to the development of new resists, capable of high throughput SCALPEL exposure. A positive resist, XP9947A, has exhibited 100 nm and 80 nm dense line resolution with good sensitivity and dose latitude. The influence of DUV absorption and 100 KV e-beam absorption to the optimization process is discussed. The nature of 100 KV e-beam absorption enables a greater freedom of resist design than encountered for DUV resists.

Citation Download Citation

Leonidas E. Ocola, Myrtle I. Blakey, Paul A. Orphanos, Wai-Yi Li, Anthony E. Novembre, Robert L. Brainard, Joseph F. Mackevich, and Gary N. Taylor "Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390055

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