Paper
3 September 1999 Characterization of nanostructures micromachined with focused ion beams (FIBs)
Catherine Y. Wong, Jie Xhie, Keith M. Moulding
Author Affiliations +
Proceedings Volume 3875, Materials and Device Characterization in Micromachining II; (1999) https://doi.org/10.1117/12.360478
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
In this paper the authors would like to demonstrate, using Atomic Force Microscopy (AFM), the effects of parameters such as probe current on the micromachined profiles produced by focused ion beam. We will compare these results obtained with AFM with those using scanning electron microscopy. Control of these parameters in the fabrication of nanostructures on different substrate materials such as metals and semiconductors will also be demonstrated.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Catherine Y. Wong, Jie Xhie, and Keith M. Moulding "Characterization of nanostructures micromachined with focused ion beams (FIBs)", Proc. SPIE 3875, Materials and Device Characterization in Micromachining II, (3 September 1999); https://doi.org/10.1117/12.360478
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Ion beams

Silicon

Scanning electron microscopy

Atomic force microscopy

Silicon films

Etching

Ions

Back to Top