Uniform large-area thermionic cathode for SCALPEL

Victor Katsap; Peter B. Sewell; Warren K. Waskiewicz; Wei Zhu

doi:10.1117/12.370115

15 November 1999 Uniform large-area thermionic cathode for SCALPEL

Victor Katsap, Peter B. Sewell, Warren K. Waskiewicz, Wei Zhu

Proceedings Volume 3777, Charged Particle Optics IV; (1999) https://doi.org/10.1117/12.370115
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

An electron beam lithography tool, which employs the SCALPEL technique, requires an extremely uniform beam to illuminate the scattering Mask, with the cathode operating in the temperature limited mode. It has been previously shown that LaB6 cathodes are not stable in this mode of operation. We have explored the possibility of implementing refined Tantalum-based emitters in the SCALPEL source cathode, and have developed large-area flat cathodes featuring suitably high emission uniformity under temperature limited operation.

Citation Download Citation

Victor Katsap, Peter B. Sewell, Warren K. Waskiewicz, and Wei Zhu "Uniform large-area thermionic cathode for SCALPEL", Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); https://doi.org/10.1117/12.370115

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