Energy and polarization control in synchrotron-radiation-stimulated nanoprocess

Tsuneo Urisu; Harutaka Mekaru; Takayuki Miyamae; Shinya Hirano; Hideyuki Noda

doi:10.1117/12.370106

16 November 1999 Energy and polarization control in synchrotron-radiation-stimulated nanoprocess

Tsuneo Urisu, Harutaka Mekaru, Takayuki Miyamae, Shinya Hirano, Hideyuki Noda

Proceedings Volume 3773, X-Ray Optics Design, Performance, and Applications; (1999) https://doi.org/10.1117/12.370106
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

Synchrotron radiation (SR) stimulated process, which has characteristics of high spatial resolution and low damage, is suitable for nano-processes. Si(111) surface after removal of native oxide by SR stimulated desorption was atomically flat with no damage. If the semiconductor surface is chemically modified and chemical bonds having a weak interaction with the substrate electronic states (a localized electronic state) are formed, for example, such as SiH₂ and SiH₃, they can be broken (etched) by the SR irradiations. Efficient site specific bone breaking, overwhelming the secondary electron effects, can be expected by a resonant excitations from a core electronic state to a dissociative valence electron state. The excitation energy and polarization tunability, which is unique characteristic of the SR process, will display its power in the nano-process applications which require the atom level control.

Citation Download Citation

Tsuneo Urisu, Harutaka Mekaru, Takayuki Miyamae, Shinya Hirano, and Hideyuki Noda "Energy and polarization control in synchrotron-radiation-stimulated nanoprocess", Proc. SPIE 3773, X-Ray Optics Design, Performance, and Applications, (16 November 1999); https://doi.org/10.1117/12.370106

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