Future of optical lithography

Shinji Okazaki

doi:10.1117/12.354770

19 July 1999 Future of optical lithography

Shinji Okazaki

Proceedings Volume 3749, 18th Congress of the International Commission for Optics; (1999) https://doi.org/10.1117/12.354770
Event: ICO XVIII 18th Congress of the International Commission for Optics, 1999, San Francisco, CA, United States

Abstract

The history of optical lithography is reviewed as a basis for discussing its future. The key methods used so far to boost the resolution are: the use of a higher numerical aperture, reduction of the exposure wavelength, and the introduction of resolution enhancement technologies. For the continued use of optical lithography in the future, the exposure wavelength must be reduced. The two approaches to doing this--a gradual reduction and a sudden, large reduction--are compared.

Citation Download Citation

Shinji Okazaki "Future of optical lithography", Proc. SPIE 3749, 18th Congress of the International Commission for Optics, (19 July 1999); https://doi.org/10.1117/12.354770

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