Paper
5 May 1999 Pair charge correlations in silicon nanostructures
Nikolai T. Bagraev, Alexei D. Bouravleuv, Vitaly E. Gasumyants, Wolfgang Gehlhoff, Leonid E. Klyachkin, Anna M. Malyarenko, Alexander Naeser, Vladimir V. Romanov, Serguei A. Rykov, Ekaterina V. Vladimirskaya
Author Affiliations +
Proceedings Volume 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (1999) https://doi.org/10.1117/12.347404
Event: International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 1998, St. Petersburg, Russian Federation
Abstract
We present the findings of the single-hole and pair-hole tunneling into the negative-U centers at the edges of the self-assembly longitudinal silicon quantum wells which are realized using the surface injection of self-interstitials and vacancies controlled in the process of non-equilibrium boron diffusion into the Si(100)-wafer.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nikolai T. Bagraev, Alexei D. Bouravleuv, Vitaly E. Gasumyants, Wolfgang Gehlhoff, Leonid E. Klyachkin, Anna M. Malyarenko, Alexander Naeser, Vladimir V. Romanov, Serguei A. Rykov, and Ekaterina V. Vladimirskaya "Pair charge correlations in silicon nanostructures", Proc. SPIE 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (5 May 1999); https://doi.org/10.1117/12.347404
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Cited by 2 scholarly publications.
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KEYWORDS
Silicon

Diffusion

Nanostructures

Magnetism

Oxides

Boron

Scanning tunneling microscopy

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