Paper
5 May 1999 Evaluation of the carrier effective mass and relaxation time in nonuniformly doped semiconductor structures on the basis of spectrophotometrical experiments
Vladislav V. Nelayev, Bronislav B. Sevruk
Author Affiliations +
Proceedings Volume 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (1999) https://doi.org/10.1117/12.347407
Event: International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 1998, St. Petersburg, Russian Federation
Abstract
The numerical simulation of infrared reflection and transmission spectra for nonuniformly doped semiconductor structures (P and As in Si and Zn in GaAs) was performed. The radiation interaction with free electrons as well as phonons was taken into account. The possibility of determination of the carrier effective mass m* and relaxation time (tau) concentration dependencies from the spectrophotometrical measurements was established.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladislav V. Nelayev and Bronislav B. Sevruk "Evaluation of the carrier effective mass and relaxation time in nonuniformly doped semiconductor structures on the basis of spectrophotometrical experiments", Proc. SPIE 3687, International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (5 May 1999); https://doi.org/10.1117/12.347407
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KEYWORDS
Semiconductors

Electrons

Gallium arsenide

Infrared radiation

Silicon

Reflection

Zinc

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