Performance of a highly stable 2-kHz operation KrF laser

Tatsuo Enami; Masaki Nakano; Takayuki Watanabe; Ayako Ohbo; Tsukasa Hori; Takashi Ito; Toshihiro Nishisaka; Akira Sumitani; Osamu Wakabayashi; Hakaru Mizoguchi; Hiroaki Nakarai; Naoto Hisanaga; Takeshi Matsunaga; Hirokazu Tanaka; Tatsuya Ariga; Syouich Sakanishi; Takeshi Okamoto; Ryoichi Nodomi; Takashi Suzuki; Yuichi Takabayashi; Hitoshi Tomaru; Kiyoharu Nakao

doi:10.1117/12.354313

26 July 1999 Performance of a highly stable 2-kHz operation KrF laser

Tatsuo Enami, Masaki Nakano, Takayuki Watanabe, Ayako Ohbo, Tsukasa Hori, Takashi Ito, Toshihiro Nishisaka, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, Hiroaki Nakarai, Naoto Hisanaga, Takeshi Matsunaga, Hirokazu Tanaka, Tatsuya Ariga, Syouich Sakanishi, Takeshi Okamoto, Ryoichi Nodomi, Takashi Suzuki, Yuichi Takabayashi, Hitoshi Tomaru, Kiyoharu Nakao

Author Affiliations +

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354313
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In the semiconductor industry, it is one of the most important issues to reduce manufacturing cost of the semiconductor device by increasing throughput. We have succeeded in the development of the high repetition rate excimer laser technology, and obtained the prospect of low CoO of the laser device. In this paper, we present the performance and advanced technologies of the newest model of the KrF excimer laser for microlithography; KLES-G20K. The laser achieves 20 W of output power with 0.6 pm bandwidth at 2 kHz. The pulse to pulse energy stability, 3 sigma is less than 6 percent and integrated energy stability is within +/- 0.4 percent. By our estimation, more than 50 percent of CoO of the laser device is cut by adopting developed machine compared to a present one.

Citation Download Citation

Tatsuo Enami, Masaki Nakano, Takayuki Watanabe, Ayako Ohbo, Tsukasa Hori, Takashi Ito, Toshihiro Nishisaka, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, Hiroaki Nakarai, Naoto Hisanaga, Takeshi Matsunaga, Hirokazu Tanaka, Tatsuya Ariga, Syouich Sakanishi, Takeshi Okamoto, Ryoichi Nodomi, Takashi Suzuki, Yuichi Takabayashi, Hitoshi Tomaru, and Kiyoharu Nakao "Performance of a highly stable 2-kHz operation KrF laser", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354313

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available