Index of refraction and its temperature dependence of calcium fluoride near 157 nm

John H. Burnett; Rajeev Gupta; Ulf Griesmann; Ted E. Jou

doi:10.1117/12.354324

26 July 1999 Index of refraction and its temperature dependence of calcium fluoride near 157 nm

John H. Burnett, Rajeev Gupta, Ulf Griesmann, Ted E. Jou

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354324
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have made accurate measurement near 157 nm of the relative index of refraction, its dispersion, and its temperature dependence for two grades of calcium fluoride in N₂ gas. Accurate measurements of these quantities are needed for the design of lens system for 157 nm F₂ excimer-laser-based exposure tools for photolithography. These optical properties were measured with precision goniometer on prisms of the materials in a N₂ atmosphere using the minimum deviation method. The dispersion was determined using line emission radiation from a deuterium lamp at several wavelengths near 157 nm. Values of the relative refractive index for two grades of calcium fluoride in N₂ gas corrected to a temperature of 20 degrees C and a pressure of one standard atmosphere are well within our 7 ppm estimated uncertainty forth measurements. The temperature of the samples and the surrounding medium were controlled to 0.05 degrees C, which enabled accurate measurements of the temperature dependencies of the indices around room temperature near 157 nm.

Citation Download Citation

John H. Burnett, Rajeev Gupta, Ulf Griesmann, and Ted E. Jou "Index of refraction and its temperature dependence of calcium fluoride near 157 nm", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354324

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