Illuminator optimization for projection printing

Eytan Barouch; Steven L. Knodle; Steven A. Orszag; Michael S. Yeung

doi:10.1117/12.354386

26 July 1999 Illuminator optimization for projection printing

Eytan Barouch, Steven L. Knodle, Steven A. Orszag, Michael S. Yeung

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354386
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In this paper we report a new algorithm designed to enable printability and enhanced defocus budget at half and sub- half wavelength feature sizes. An integral part of this algorithm is the optimization of aerial image contrast, performed in stages, for an algorithmically determined set of contrast cost functions. The optimization is performed on the geometric shape of the condenser filter, herein referred to as the illuminator. Combining (1) illuminator optimization, (2) reticle proximity correction, and (3) attenuated phase shift masks allows one to perform corrections to aggressive SRAM mask designs with features sizes as small as 140 nm, when employing 248 nm illumination, as well as 125 nm feature sizes of lines and spaces. We also present optimizations for 80 nm lines, with 120 nm spaces using 193 nm illumination.

Citation Download Citation

Eytan Barouch, Steven L. Knodle, Steven A. Orszag, and Michael S. Yeung "Illuminator optimization for projection printing", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354386

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