Characterizing absorption and total scattering losses on optical components for 193-nm wafer steppers

Klaus R. Mann; Oliver Apel; Eric Eva

doi:10.1117/12.354307

26 July 1999 Characterizing absorption and total scattering losses on optical components for 193-nm wafer steppers

Klaus R. Mann, Oliver Apel, Eric Eva

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354307
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The performance of DUV optical components is assessed by measuring both absorption and scatter losses during ArF excimer laser irradiation. Absolute absorptance is determined by employing a high-resolution calorimetric technique which provides greatly enhanced sensitivity compared to transmissive measurements. Thus, the determinant of single and two-photon absorption coefficients at energy densities of several 10 mJ/cm² is accomplished. As a result of its sensitivity, UV laser calorimetry can be also employed for fast monitoring of laser induced aging phenomena like color center formation in fused silica or CaF₂. For monitoring of the scatter losses in DUV optics, a total scattering setup was recently installed, using an ArF excimer laser as pulsed 193 nm light source and a Coblentz hemisphere as integrating element. Results of quantitative absorption and scatter measurements at 193 and 248 nm are presented for coated and uncoated optics, and the contribution of the various loss channels is discussed.

Citation Download Citation

Klaus R. Mann, Oliver Apel, and Eric Eva "Characterizing absorption and total scattering losses on optical components for 193-nm wafer steppers", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354307

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