Sensitivity analysis of fitting for scatterometry

Petre-Catalin Logofatu; John Robert McNeil

doi:10.1117/12.350805

14 June 1999 Sensitivity analysis of fitting for scatterometry

Petre-Catalin Logofatu, John Robert McNeil

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350805
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The sensitivity analysis of fitting (SAF) is a formalism that determines the type of measurements that yields optimum determination precision. SAF is applied to ellipsometric- scatterometry of surface relief gratings and for the optimum measurement configuration predicts a significant improvement compared to the conventional scatterometry measurement configurations. The SF predictions for precision are compared to actual values obtained experimentally, and a qualitative agreement is obtained. The discrepancies between theory and experiment are likely due to inaccurate modeling of the grating.

Citation Download Citation

Petre-Catalin Logofatu and John Robert McNeil "Sensitivity analysis of fitting for scatterometry", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350805

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