Optical materials and coatings at 157 nm

Theodore M. Bloomstein; Vladimir Liberman; Mordechai Rothschild; D. E. Hardy; Russell B. Goodman

doi:10.1117/12.351106

25 June 1999 Optical materials and coatings at 157 nm

Theodore M. Bloomstein, Vladimir Liberman, Mordechai Rothschild, D. E. Hardy, Russell B. Goodman

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351106
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We update previously reported results on the absorption of optical materials and coatings for use in 157 nm based optical projection system. New results include the transmissions spectrum of a modified from of fused silica with suitable initial transmission for use as a mask substrate. We also report on a more systematic study of the effects of surface contaminants on optical components at 157 nm. We have modified our vacuum spectrometer to allow in- situ cleaning to enable a closer examination of purging requirements and cleaning procedures.

Citation Download Citation

Theodore M. Bloomstein, Vladimir Liberman, Mordechai Rothschild, D. E. Hardy, and Russell B. Goodman "Optical materials and coatings at 157 nm", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351106

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