Commercial manufacturing of SCALPEL mask blanks

Mark D. Walters

doi:10.1117/12.351086

25 June 1999 Commercial manufacturing of SCALPEL mask blanks

Mark D. Walters

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351086
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In the SCALPEL system developed by Lucent Technologies, a mask consisting of a low atomic number membrane and a high atomic number pattern layer is uniformly illuminated by high energy electrons. Commercialization of the SCALPEL technology requires a manufacturing infrastructure for mask fabrication. This infrastructure is composed of a mask blank supplier who fabricates the membrane mask structure, and a mask patterning facility that writes and etches the patterns into the high atomic number layer. In collaboration with Lucent Technologies, MCNC has developed and implemented a fabrication process and measurement methodology in an effort to establish a commercially viable manufacturing line for SCALPEL mask blanks. This paper presents the process and measurement methodology, measurement result, the key issues associated with this effort.

Citation Download Citation

Mark D. Walters "Commercial manufacturing of SCALPEL mask blanks", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351086

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