Light Scattering In Leached Antireflection Surfaces

Alexander J. Marker III; Lee Cook; Karl-Heinz Mader

doi:10.1117/12.934144

5 April 1983 Light Scattering In Leached Antireflection Surfaces

Alexander J. Marker III, Lee Cook, Karl-Heinz Mader

Proceedings Volume 0362, Scattering in Optical Materials II; (1983) https://doi.org/10.1117/12.934144
Event: 26th Annual Technical Symposium, 1982, San Diego, United States

Abstract

Chemical leaching processes used to produce antireflective surfaces on glass have been shown to exhibit extremely high laser damage thresholds. For evaluation of their utility in short wavelength operation, surface and bulk scattering effects in samples treated by two processes were investigated. The scattering effects observed in the two processes are compared with evaporated λ/4 interference films. The Neutral Solution process AR surface performs better at short wavelengths than the Minot etch/leached gradient AR surface produced on phase-separated glass because the light scattering associated with the Minot etch/ leached surface is high.

Citation Download Citation

Alexander J. Marker III, Lee Cook, and Karl-Heinz Mader "Light Scattering In Leached Antireflection Surfaces", Proc. SPIE 0362, Scattering in Optical Materials II, (5 April 1983); https://doi.org/10.1117/12.934144

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