Ultraviolet laser damage and optical properties of thin films deposited by reactive-rf-magnetron sputtering (Abstract Only)

Kunio Yoshida; Takeshi Kamiya; Noriaki Tochio; Kanyoshi Ochi; Schukichi Kaku; Tomosumi Kamimura; Hidetsugu Yoshida; Tsuyoshi Okamoto

doi:10.1117/12.344459

7 April 1999 Ultraviolet laser damage and optical properties of thin films deposited by reactive-rf-magnetron sputtering (Abstract Only)

Kunio Yoshida, Takeshi Kamiya, Noriaki Tochio, Kanyoshi Ochi, Schukichi Kaku, Tomosumi Kamimura, Hidetsugu Yoshida, Tsuyoshi Okamoto

Author Affiliations +

Proceedings Volume 3578, Laser-Induced Damage in Optical Materials: 1998; (1999) https://doi.org/10.1117/12.344459
Event: Laser-Induced Damage in Optical Materials: 1998, 1998, Boulder, CO, United States

Abstract

Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate and the change of spectral characteristics in the relative humidity. Thin films deposited by reactive-rf- magnetron sputtering improve these problems. Laser-induced damage thresholds at 355nm, measured by 1-on-1 and R-on-1 methods, of substrate and single high index zirconia, hafnia and aluminum oxide, and low-index silicon dioxide coated by magnetron sputtering, are reported.

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Kunio Yoshida, Takeshi Kamiya, Noriaki Tochio, Kanyoshi Ochi, Schukichi Kaku, Tomosumi Kamimura, Hidetsugu Yoshida, and Tsuyoshi Okamoto "Ultraviolet laser damage and optical properties of thin films deposited by reactive-rf-magnetron sputtering (Abstract Only)", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344459

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