MoSi PSM defect inspection and sensitivity analysis

Jerry Xiaoming Chen; Robert K. Henderson; Franklin D. Kalk

doi:10.1117/12.332816

18 December 1998 MoSi PSM defect inspection and sensitivity analysis

Jerry Xiaoming Chen, Robert K. Henderson, Franklin D. Kalk

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332816
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

The increasing use of MoSi-based attenuated embedded shifter phase shift masks (PSMs) necessitates MoSi defect inspection and classification. The optical properties of MoSi are quite different than conventional Cr-based binary materials, so inspection tool sensitivity to MoSi defects must be characterized. Sensitivity analysis of a KLA 351 with APA algorithm has been performed on both i-line and DUV PSMs with a variety of Verithoro patterns. The programmed defect sizes were measured on a JEOL JWS-7815 SEM that was calibrated with polystyrene latex spheres for defect sizes less than or equal to 0.4 micrometer, yielding a more accurate small defect sensitivity analysis than in the past. Examples of MoSi defect capture and review are also presented.

Citation Download Citation

Jerry Xiaoming Chen, Robert K. Henderson, and Franklin D. Kalk "MoSi PSM defect inspection and sensitivity analysis", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332816

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