Electron beam lithography on LiF films for integrated active optical waveguides

Giuseppe Baldacchini; E. Burattini; Antonio Grilli; A. Raco; Antonella Mancini; Rosa Maria Montereali; A. Pace

doi:10.1117/12.316557

14 July 1998 Electron beam lithography on LiF films for integrated active optical waveguides

Giuseppe Baldacchini, E. Burattini, Antonio Grilli, A. Raco, Antonella Mancini, Rosa Maria Montereali, A. Pace

Proceedings Volume 3423, Second GR-I International Conference on New Laser Technologies and Applications; (1998) https://doi.org/10.1117/12.316557
Event: Second GR-I International Conference on New Laser Technologies and Applications, 1997, Olympia, Greece

Abstract

Low energy electron beam irradiation of LiF single crystals and polycrystalline films induces efficient formation of stable laser active defects emitting in the visible spectral range at room temperature, together with a consistent increase of the real part of the refractive index in the same wavelength interval. The use of electron lithography techniques look promising for the realization of active channel waveguides.

Citation Download Citation

Giuseppe Baldacchini, E. Burattini, Antonio Grilli, A. Raco, Antonella Mancini, Rosa Maria Montereali, and A. Pace "Electron beam lithography on LiF films for integrated active optical waveguides", Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); https://doi.org/10.1117/12.316557

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