Study of optical properties of layered systems by multiangle ellipsometry

Lubov A. Zabashta

doi:10.1117/12.306269

20 April 1998 Study of optical properties of layered systems by multiangle ellipsometry

Lubov A. Zabashta

Proceedings Volume 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997; (1998) https://doi.org/10.1117/12.306269
Event: International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, 1997, Kiev, Ukraine

Abstract

The authors discuss the possibility of studying the optical properties of multilayer films using multiangle ellipsometry. The investigation was carried out on W/Si metal superlattice produced by high-frequency sputtering deposition. The effective optical constants n_f and k_f were analyzed as a function of the superlattice period in the framework of the theory of optical properties of multilayer systems. The optic response of the W/Si system was simulated based on the approximations from the theory of the effective medium including the interfacial layer in the model. In the analysis use was made of the dielectric functions of the W and the Si films determined separately.

Citation Download Citation

Lubov A. Zabashta "Study of optical properties of layered systems by multiangle ellipsometry", Proc. SPIE 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997, (20 April 1998); https://doi.org/10.1117/12.306269

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