Fabrication of 2D multilevel phase holographic beamsplitters using e-beam lithography

Andrei L. Mikaelian; Sergei A. Prokopenko; Aleksandr N. Palagushkin

doi:10.1117/12.302473

10 March 1998 Fabrication of 2D multilevel phase holographic beamsplitters using e-beam lithography

Andrei L. Mikaelian, Sergei A. Prokopenko, Aleksandr N. Palagushkin

Proceedings Volume 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing; (1998) https://doi.org/10.1117/12.302473
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation

Abstract

The results of 2D multiple-levels phase holographic high efficiency laser beam-splitters computer design and fabrication using direct E-beam phase relief recording in E- resist layer, chemical and reactive ion etching processing are described. The good agreement between theory predictions and the performance of fabricated splitters for a visible range of waves is observed.

Citation Download Citation

Andrei L. Mikaelian, Sergei A. Prokopenko, and Aleksandr N. Palagushkin "Fabrication of 2D multilevel phase holographic beamsplitters using e-beam lithography", Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); https://doi.org/10.1117/12.302473

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available