Surface finish and optical quality of CaF2 for UV lithography applications

Angela Duparre; Roland Thielsch; Norbert Kaiser; Stefan Jakobs; Klaus R. Mann; Eric Eva

doi:10.1117/12.310735

29 June 1998 Surface finish and optical quality of CaF₂ for UV lithography applications

Angela Duparre, Roland Thielsch, Norbert Kaiser, Stefan Jakobs, Klaus R. Mann, Eric Eva

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310735
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

CaF₂ has received increasing attention as a promising substrate for coatings in the VUV range. Optimization of the optical properties of these optical components requires the study of basic characteristics of the coated and uncoated CaF₂ substrates such as surface roughness, optical performance, absorption and scatter losses, and laser induced damage threshold. The investigations reveal the influence of different substrate polishing grades on the quality of the coated components.

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Angela Duparre, Roland Thielsch, Norbert Kaiser, Stefan Jakobs, Klaus R. Mann, and Eric Eva "Surface finish and optical quality of CaF₂ for UV lithography applications", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310735

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