0.25-um logic manufacturability using practical 2D optical proximity correction

Michael E. Kling; Kevin D. Lucas; Alfred J. Reich; Bernard J. Roman; Harry Chuang; Percy V. Gilbert; Warren D. Grobman; Edward O. Travis; Paul Tsui; Tam Vuong; Jeff P. West

doi:10.1117/12.310749

29 June 1998 0.25-μm logic manufacturability using practical 2D optical proximity correction

Michael E. Kling, Kevin D. Lucas, Alfred J. Reich, Bernard J. Roman, Harry Chuang, Percy V. Gilbert, Warren D. Grobman, Edward O. Travis, Paul Tsui, Tam Vuong, Jeff P. West

Author Affiliations +

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310749
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Simplified 2-D Optical Proximity Correction (OPC) algorithms have been devised, calibrated and implemented on a state-of- the-art 0.25 micrometer random logic process in order to reduce metal line pullback on critical layers. The techniques used are rules-based, but are characterized by fast and robust data conversion algorithms, calibrations based on actual process data improvements in reticle manufacturability, and inspectability of the resultant OPC corrected reticles. Application to local interconnect and metal patterning has corrected fundamental yield-limiting mechanisms in these levels.

Citation Download Citation

Michael E. Kling, Kevin D. Lucas, Alfred J. Reich, Bernard J. Roman, Harry Chuang, Percy V. Gilbert, Warren D. Grobman, Edward O. Travis, Paul Tsui, Tam Vuong, and Jeff P. West "0.25-μm logic manufacturability using practical 2D optical proximity correction", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310749

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