Recent advances in increasing the thermal flow resistance of acetal derivatized polyhydroxystyrene deep-UV matrix resins

Janet M. Kometani; Francis M. Houlihan; Allen G. Timko; Omkaram Nalamasu; Elsa Reichmanis; Sharon A. Heffner; Mary E. Galvin-Donoghue

doi:10.1117/12.312466

29 June 1998 Recent advances in increasing the thermal flow resistance of acetal-derivatized polyhydroxystyrene deep-UV matrix resins

Janet M. Kometani, Francis M. Houlihan, Allen G. Timko, Omkaram Nalamasu, Elsa Reichmanis, Sharon A. Heffner, Mary E. Galvin-Donoghue

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312466
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The incorporation of the acetoxy group (AC) increases the thermal flow resistance of acetal derivatized polyhydroxystyrene matrices (ADPHS) without compromising the desirable dissolution characteristics. Two methods of introducing acetoxy to ADPHS resins were developed: (1) An economical one pot synthesis was utilized to make tertiary polymer containing hydroxystyrene (HS), acetoxystyrene (ACS) and acetals of HS. (2) We exploited the unique blending properties of poly(HS/ACS) and poly(HS/acetal HS). Both approaches were evaluated lithographically at 248 nm. It was found that both the tertiary polymer and blending approaches resulted in resists materials with improved T_g while giving resolutions down to 0.20 micrometers for line and space pairs and 0.15 micrometers for isolated lines.

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Janet M. Kometani, Francis M. Houlihan, Allen G. Timko, Omkaram Nalamasu, Elsa Reichmanis, Sharon A. Heffner, and Mary E. Galvin-Donoghue "Recent advances in increasing the thermal flow resistance of acetal-derivatized polyhydroxystyrene deep-UV matrix resins", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312466

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