Paper
29 June 1998 Dissolution of phenolic polymers in aqueous base: the influence of polymer structure
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Abstract
The differences in the dissolution behavior of novolac and poly(4-hydroxystyrene) (PHS) can be explained in terms of differences in the pKa of the two polymers. The proximity of the hydroxyl groups in ortho-ortho bonded novolac causes a large change in the pKa of the polymer as a function of the degree of ionization. The increased distance between phenolic sites in PHS attenuates this effect. Novolac and PHS samples have been titrated from basic to acidic conditions to determine the `apparent pKa' of each polymer as a function of degree of ionization, (alpha) . The turbidimetric endpoints show that novolac precipitates earlier in the titration than PHS. This differences provides an explanation for the `ortho-ortho effect' and the different inhibition efficiencies of these polymers.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher L. McAdams, Lewis W. Flanagin, Clifford L. Henderson, Adam R. Pawlowski, Pavlos C. Tsiartas, and C. Grant Willson "Dissolution of phenolic polymers in aqueous base: the influence of polymer structure", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312345
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Cited by 4 scholarly publications.
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KEYWORDS
Polymers

Ionization

Hydrogen

Diffusion

Photoresist materials

Chromophores

Deep ultraviolet

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