Paper
30 June 1982 Application Of Methyl α-Chloroacrylate Copolymers As Electron Sensitive Positive Resists
Juey H. Lai
Author Affiliations +
Abstract
Poly(methly a-chloracrylate) (PMCA) is one of the vinyl polymers which is highly sensitive to high energy radiation. The G, value (defined as number of chain scission events per 100 ev of energy absorbed) of PMCA is 6.0 which is significantly higher than 1.6 of PMMA - the current standard e-beam resist. Used as a positive electron resist, the sensitivity of PMCA is considerably better than PMMA but less than one would expect from its high Gs' Such behavior can be attributed to: (a) the occurrence of non-negligible concurrent crosslinking in PMCA and (b) the poor solubility of PMCA. In the past, we have reported the synthesis, characterization and e-beam exposure results for the copolymers of MCA and several methacrylates, including methyl methacrylate (MMA), cyclohexyl methacrylate and n-hexyl methacrylate. In the present paper, the results of our recent studies for the copolymers of MCA and n-butyl methacrylate (BMA), of MCA and methacrylic acid (MAA) and the new results for the copolymers of MCA and MMA are presented. The optimization of copolymer composition and molecular weight, and the selection of developers based on solubility parameter concept are discussed in the paper. It has been found that both MCA/BMA and MCA/MMA copolymer resists possess submicron resolution and are significantly more sensitive than PMMA.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juey H. Lai "Application Of Methyl α-Chloroacrylate Copolymers As Electron Sensitive Positive Resists", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933405
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KEYWORDS
Polymers

Polymerization

Polymethylmethacrylate

Glasses

Submicron lithography

Temperature metrology

Scanning electron microscopy

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