Paper
8 April 1998 Photoresist microparabolas for beam steering
Samuel K. Rotich, Jim G. Smith, Alan G. R. Evans, Arthur Brunnschweiler
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Abstract
A simple grating mask has been used in an ordinary 5:1 projection stepper equipment to fabricate microscopic parabolic topographies in thick positive photoresist. The microparabolic surfaces created were coated with reflective material to form parabolic reflectors. Measurement values of focal length were in agreement with the expected theoretical values. The simple parabola forms the basis for the fabrication of compound parabolic reflector which can be used for beam steering. Normal incidence beam can be redirected by the compound parabolic reflector onto device areas in the vicinity of the focus.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Samuel K. Rotich, Jim G. Smith, Alan G. R. Evans, and Arthur Brunnschweiler "Photoresist microparabolas for beam steering", Proc. SPIE 3287, Photodetectors: Materials and Devices III, (8 April 1998); https://doi.org/10.1117/12.304502
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KEYWORDS
Photoresist materials

Photomasks

Reflectors

Beam steering

Semiconducting wafers

Opacity

Mirrors

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