Stress, Adherence, Hardness, And Density Of Optical Thin Films

H. K. Pulker

doi:10.1117/12.933290

29 April 1982 Stress, Adherence, Hardness, And Density Of Optical Thin Films

H. K. Pulker

Proceedings Volume 0325, Optical Thin Films; (1982) https://doi.org/10.1117/12.933290
Event: 1982 Los Angeles Technical Symposium, 1982, Los Angeles, United States

Abstract

Results of measurements on mechanical properties of metal films (Ag, Al, Cr) and of some dielectric films (mainly MgF2, CaF2, BaF2) used in optics are presented and discussed. The obtained values showed a strong dependence on preparation conditions (residual atmosphere, deposition rate). Structural and microstructural investigations provided the data required to calculate the intrinsic tensile stress of polycrystalline MgF2 and Cr films according to a grainboundary model.

Citation Download Citation

H. K. Pulker "Stress, Adherence, Hardness, And Density Of Optical Thin Films", Proc. SPIE 0325, Optical Thin Films, (29 April 1982); https://doi.org/10.1117/12.933290

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