Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm

Anne Fornier; C. Cordillot; D. Schirman; Francois Y. Genin; Alan K. Burnham; Pamela K. Whitman; Michael D. Feit; Alexander M. Rubenchik; J. M. Yoshiyama

doi:10.1117/12.307038

20 April 1998 Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm

Anne Fornier, C. Cordillot, D. Schirman, Francois Y. Genin, Alan K. Burnham, Pamela K. Whitman, Michael D. Feit, Alexander M. Rubenchik, J. M. Yoshiyama

Author Affiliations +

Proceedings Volume 3244, Laser-Induced Damage in Optical Materials: 1997; (1998) https://doi.org/10.1117/12.307038
Event: Laser-Induced Damage in Optical Materials: 1997, 1997, Boulder, CO, United States

Abstract

A set of fused silica windows were artificially contaminated by sputtering various thin film materials onto the surface to simulate target chamber contamination of high fluence optical components. The samples were then tested 1/1 and N/1 at 355 nm in air and vacuum with a 3- ns Nd:YAG laser to measure the damage threshold as a function of film thickness and film composition. The damage morphologies were characterized by Nomarski optical microscopy and SEM. The results show that thin film contamination leads to a decrease in damage threshold. The test also show a difference in damage behavior between air and vacuum. The results were compared to a model of the absorption of laser light in the film, shockwave generation and reflection, and heating dependence on film composition and thickness.

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Anne Fornier, C. Cordillot, D. Schirman, Francois Y. Genin, Alan K. Burnham, Pamela K. Whitman, Michael D. Feit, Alexander M. Rubenchik, and J. M. Yoshiyama "Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.307038

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