Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing

Yi-Chuan Lo; Chih-Hsiung Lee; Yang-Tung Fan; Chih-Kung Chang

doi:10.1117/12.280544

14 August 1997 Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing

Yi-Chuan Lo, Chih-Hsiung Lee, Yang-Tung Fan, Chih-Kung Chang

Author Affiliations +

Proceedings Volume 3183, Microlithographic Techniques in IC Fabrication; (1997) https://doi.org/10.1117/12.280544
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore

Abstract

The focus window of various topographies and substrate was discussed in this paper. Also the electric test data and Cp yield with different focus will be introduced. Finally, the usable depth of focus and auto focus system will be applied to describe the difference between machine and process best focus.

Citation Download Citation

Yi-Chuan Lo, Chih-Hsiung Lee, Yang-Tung Fan, and Chih-Kung Chang "Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing", Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); https://doi.org/10.1117/12.280544

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